Oklahoma State University - Tulsa
Oklahoma State University - Tulsa

Expertech CTR 125 Furnace/LPCVD

The LPCVD (Low Pressure Chemical Vapor Depositor) uses low pressures and high temperatures (~660°C) to deposit a more uniform layer of silicon oxide compared to PECVD. This system is composed of two tube furnaces, one which is plumbed with silane for silicon dioxide deposition and the other for wet/dry thermal growth of silicon dioxide (~1100°C).

Furnace 1 - Standard Tube Furnace w/Bubbler: RT..1100degC
Furnace 2 - LPCVD w/SiH4 & H2: RT..670C

Expertech CTR 125 Furnace/LPCVD