Oklahoma State University - Tulsa
Oklahoma State University - Tulsa

Karl Suss MA6 Mask Aligner with BSA

Mask aligners are used in photolithographic processes to transfer a pattern from a mask to a photoresist coating on a substrate. This tool accepts 4” wafers and can be used for either 435nm or 365nm sensitive photoresists. Top side alignments and bask side alignment (BSA) can be performed.

Mask aligners are used in photolithographic processes to transfer a pattern from a mask to a photoresist coating on a substrate. This tool accepts 4” wafers and can be used for either 435nm or 365nm sensitive photoresists. Top side alignments and bask side alignment (BSA) can be performed.